Adjustment for application of ion beam and material excitation

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The aim is an improvement and adjustment of the transport system of light and heavy ion beams from two 200 keV Cockcroft-Walton type accelerator devices at Himeji Institute of Technology and accerelation of metal ion. The beam transport system was improved to control the size and shape freely, and to able to obtain stable beam. The light ion implantation experiments in various specimens were made using stable beam and the results were published.One of two accelerators was improved to accelerate a metal ion(Ni-ion] with a tandem acceleration method. The extracted negative metal ions are converted to positive ions on the half way in acceleration with a Argongas charge stripper. The simultaneous implantation of different ion species accelerated by two accelerators became to be possible owing to the improvement of a metal ion source and the acceleration.One of the problems is an efficiency of charge concersion. Various and wide application tof this system is expected by improvement of the charge conversion efficiency with Argon gas charge stripper. More improvemnet is in progress at present.