Development and commercialisation of resist technologies for nanofabrication

纳米制造抗蚀剂技术的开发和商业化

• 批准号: 104747
• 金额: $ 50.03万
• 依托单位: SCI-TRON LIMITED
• 依托单位国家: 英国
• 项目类别: Collaborative R&D
• 财政年份: 2019
• 资助国家: 英国
• 起止时间: 2019 至 无数据
• 项目状态: 已结题
• 来源: https://gtr.ukri.org/projects?ref=104747
• 关键词: Development; commercialisation; resist; technologies; nanofabrication

"For the last 40 years, the semiconductor industry has been producing increasingly powerful, power efficient, and affordable electronic devices mainly due to innovative developments in lithography (semiconductor patterning) equipment and materials. Improvements in photolithography (PL) and electron beam lithography (EBL) equipments have delivered progressively higher resolution images with every generation. As part of the lithography process, 'resists' are used as materials that physically record exposure patterns on a silicon wafer as imaged from a mask. To realize the improvements in photolithography equipments, resist performance must keep pace.Sci-Tron Ltd are developing resists which can be tailored to meet the challenges presented by all forms of lithography. This Innovate UK proposal is to build our capacity to supply the PL and EBL markets. The testing we have performed suggests we have products that can produce a major competitive advantage to many UK companies which use lithography. Developing the best business model for this diverse market-place will be a key target of this project. Currently we can produce resists in laboratory conditions at a gram scale.During this project, we will develop a flexible manufacturing process which aims to produce a catalogue of resists to satisfy a large number of potential end-users that will have diverse needs, diverse scale and who may use either EBL or PL as a writing tool. For some resists we will need to scale-up and maintain low cost; for other bespoke resists small scale will be sufficient, but with the capacity to produce on demand and with a high profit on small amounts of material. In partnership with the University of Manchester (UoM), this 18 months industrial research project will help us developing manufacturing capability which provides flexibility to switch between different resists while maintaining the required quality control.Key project activities include;1) design and build a flexible manufacturing facility capable of a 20kg per annum throughput of resist, and capable of switching between different resist formulations to meet specific end-user requirements,2) complete application specific testing with key partners to develop resist materials to TRL6, and3) develop a complete business plan detailing the resources, distribution and supply chain required, and the value proposition, team composition and expected financial outcomes for Sci-Tron."

“在过去的40年里，半导体行业一直在生产越来越强大，节能，价格实惠的电子设备，主要是由于光刻（半导体图案）设备和材料的创新发展。光刻（PL）和电子束光刻（EBL）设备的改进每一代都提供了越来越高的分辨率图像。作为光刻工艺的一部分，“抗蚀剂”被用作从掩模成像的硅晶圆上物理记录曝光模式的材料。为了实现光刻设备的改进，抗蚀性能必须跟上。Sci-Tron有限公司正在开发可定制的抗蚀剂，以满足各种形式的光刻所带来的挑战。“创新英国”的提议是建立我们为物流和电子物流市场提供服务的能力。我们进行的测试表明，我们的产品可以对许多使用光刻技术的英国公司产生重大的竞争优势。为这个多样化的市场开发最佳的商业模式将是这个项目的一个关键目标。目前我们可以在实验室条件下以克为单位生产抗蚀剂。在这个项目中，我们将开发一种灵活的制造工艺，旨在生产一种抗蚀剂目录，以满足大量潜在的最终用户，这些用户将有不同的需求，不同的规模，可能使用EBL或PL作为书写工具。对于一些抗蚀剂，我们需要扩大规模并保持低成本；对于其他定制的抗蚀剂，小规模就足够了，但有能力按需生产，并在少量材料上获得高利润。与曼彻斯特大学（UoM）合作，这个为期18个月的工业研究项目将帮助我们发展制造能力，在保持所需质量控制的同时，在不同的抗蚀剂之间提供灵活性切换。主要项目活动包括：1)设计和建造一个灵活的制造设施，每年能够生产20公斤的抗蚀剂，并能够在不同的抗蚀剂配方之间切换，以满足特定的最终用户需求；2)与关键合作伙伴一起完成特定应用的测试，以开发TRL6的抗蚀剂材料；3)制定完整的商业计划，详细说明所需的资源、分销和供应链，以及Sci-Tron的价值主张、团队组成和预期财务结果。”