Radioisotope-powered Parallel Electron Lithography for High-throughput Nano-manufacturing

用于高通量纳米制造的放射性同位素驱动并行电子光刻

• 批准号: DE140100805
• 负责人: Prof Yuerui Lu
• 金额: $ 27.63万
• 依托单位: The Australian National University
• 依托单位国家: 澳大利亚
• 项目类别: Discovery Early Career Researcher Award
• 财政年份: 2014
• 资助国家: 澳大利亚
• 起止时间: 2014-03-15 至 2017-06-30
• 项目状态: 已结题
• 来源: https://dataportal.arc.gov.au/RGS/Web/Grants/DE140100805
• 关键词: Radioisotope; powered; Parallel; Electron; Lithography

This project aims to realise rapid fabrication of controllable nano-devices over large areas with high throughput and low cost. The lack of large-size (greater than four inch) mask and ultra-low dose resist are the fundamental challenges for high-throughput radioisotope-powered parallel electron nano-lithography (RIPEL) systems. This project aims to realise a large-size RIPEL mask by using the ultra-light supporting material aerographite that has a state-of-the-art ratio value of Young's modulus to cubic density. It will also develop a new inorganic nanoparticle resist with ultra-low dose. These building blocks will enhance RIPEL's throughput by four orders of magnitude. The project will contribute to making processors or solid state storage cheaper and more efficient.

该项目旨在以高产量和低成本实现大面积可控纳米器件的快速制造。缺乏大尺寸（大于4英寸）掩模和超低剂量抗蚀剂是高通量放射性同位素驱动的并行电子纳米光刻（RIPEL）系统的根本挑战。该项目旨在通过使用具有最先进的杨氏模量与立方密度比值的超轻支撑材料航空石墨来实现大尺寸RIPEL掩模。它还将开发一种新的超低剂量无机纳米颗粒抗蚀剂。这些构建模块将使RIPEL的吞吐量提高四个数量级。该项目将有助于使处理器或固态存储更便宜，更高效。