Radioisotope-powered Parallel Electron Lithography for High-throughput Nano-manufacturing

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This project aims to realise rapid fabrication of controllable nano-devices over large areas with high throughput and low cost. The lack of large-size (greater than four inch) mask and ultra-low dose resist are the fundamental challenges for high-throughput radioisotope-powered parallel electron nano-lithography (RIPEL) systems. This project aims to realise a large-size RIPEL mask by using the ultra-light supporting material aerographite that has a state-of-the-art ratio value of Young's modulus to cubic density. It will also develop a new inorganic nanoparticle resist with ultra-low dose. These building blocks will enhance RIPEL's throughput by four orders of magnitude. The project will contribute to making processors or solid state storage cheaper and more efficient.