Thin film intermetallic materials for spintronic applications

用于自旋电子学应用的薄膜金属间材料

• 批准号: 2889340
• 金额: --
• 依托单位: University of Liverpool
• 依托单位国家: 英国
• 项目类别: Studentship
• 财政年份: 2023
• 资助国家: 英国
• 起止时间: 2023 至 无数据
• 项目状态: 未结题
• 来源: https://gtr.ukri.org/projects?ref=studentship-2889340
• 关键词: Thin; film; intermetallic; materials; spintronic

In order to keep up with the computational power that is constantly evolving, the development of spintronic devices have been introduced. These devices manipulate the spin of an electron rather than the charge. In order to create such devices one must rely on thin films with precise microstructure. Moreover, by understanding the symmetry of the underlying crystal structure one can create these new devices and encode information in electron spin. By doing this these devices are far more energy efficient than the current technologies.In this project I will be using physical vapour deposition under an ultra-high-vacuum to create thin films, which are then used for spintronic applications. To begin with different materials will be made however, as the duration of the project goes on a specific intermetallic material will be analysed. In order to analyse these materials many measurements of X-ray diffraction and X-ray reflectivity will be carried out. This will help understand the crystal structure of the thin film in order to make any adjustments to the thin film during the physical vapour deposition phase. Not only will crystal structure be understood but the surface roughness, density and film thickness can also be found. The material that will be specialised in will have its various magnetic properties investigated in order to determine which spintronic application is best suited for it. Such examples of this are magneto-optical characterisation, low temperature spin and electronic transport measurements. For the chosen material the symmetry can be exploited through varying composition which can influence band structure and spin charge conversion. Allowing for a greater understanding of the thin film and hence knowing its potential applications in the field of spinstronics.

为了跟上不断发展的计算能力，已经引入了自旋电子器件的发展。这些装置操纵的是电子的自旋而不是电荷。为了制造这样的器件，必须依赖于具有精确微结构的薄膜。此外，通过理解底层晶体结构的对称性，人们可以创建这些新设备并将信息编码为电子自旋。在这个项目中，我将在超高真空下使用物理气相沉积来制造薄膜，然后将其用于自旋电子学应用。开始时，将使用不同的材料，但随着项目持续时间的推移，将分析特定的金属间化合物材料。为了分析这些材料，将进行X射线衍射和X射线反射率的许多测量。这将有助于理解薄膜的晶体结构，以便在物理气相沉积阶段对薄膜进行任何调整。不仅要了解晶体结构，还要了解其表面粗糙度、密度和薄膜厚度。为了确定最适合于自旋电子学应用的材料，将对材料的各种磁性进行研究，例如磁光特性、低温自旋和电子输运测量。对于所选择的材料，可以通过改变可以影响能带结构和自旋电荷转换的组成来利用对称性。允许更好地了解薄膜，从而了解其在空间电子学领域的潜在应用。