Thin film intermetallic materials for spintronic applications

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In order to keep up with the computational power that is constantly evolving, the development of spintronic devices have been introduced. These devices manipulate the spin of an electron rather than the charge. In order to create such devices one must rely on thin films with precise microstructure. Moreover, by understanding the symmetry of the underlying crystal structure one can create these new devices and encode information in electron spin. By doing this these devices are far more energy efficient than the current technologies.In this project I will be using physical vapour deposition under an ultra-high-vacuum to create thin films, which are then used for spintronic applications. To begin with different materials will be made however, as the duration of the project goes on a specific intermetallic material will be analysed. In order to analyse these materials many measurements of X-ray diffraction and X-ray reflectivity will be carried out. This will help understand the crystal structure of the thin film in order to make any adjustments to the thin film during the physical vapour deposition phase. Not only will crystal structure be understood but the surface roughness, density and film thickness can also be found. The material that will be specialised in will have its various magnetic properties investigated in order to determine which spintronic application is best suited for it. Such examples of this are magneto-optical characterisation, low temperature spin and electronic transport measurements. For the chosen material the symmetry can be exploited through varying composition which can influence band structure and spin charge conversion. Allowing for a greater understanding of the thin film and hence knowing its potential applications in the field of spinstronics.