Thin film intermetallic materials for spintronic applications

用于自旋电子学应用的薄膜金属间材料

• 批准号: 2889340
• 金额: --
• 依托单位: University of Liverpool
• 依托单位国家: 英国
• 项目类别: Studentship
• 财政年份: 2023
• 资助国家: 英国
• 起止时间: 2023 至 无数据
• 项目状态: 未结题
• 来源: https://gtr.ukri.org/projects?ref=studentship-2889340
• 关键词: Thin; film; intermetallic; materials; spintronic

In order to keep up with the computational power that is constantly evolving, the development of spintronic devices have been introduced. These devices manipulate the spin of an electron rather than the charge. In order to create such devices one must rely on thin films with precise microstructure. Moreover, by understanding the symmetry of the underlying crystal structure one can create these new devices and encode information in electron spin. By doing this these devices are far more energy efficient than the current technologies.In this project I will be using physical vapour deposition under an ultra-high-vacuum to create thin films, which are then used for spintronic applications. To begin with different materials will be made however, as the duration of the project goes on a specific intermetallic material will be analysed. In order to analyse these materials many measurements of X-ray diffraction and X-ray reflectivity will be carried out. This will help understand the crystal structure of the thin film in order to make any adjustments to the thin film during the physical vapour deposition phase. Not only will crystal structure be understood but the surface roughness, density and film thickness can also be found. The material that will be specialised in will have its various magnetic properties investigated in order to determine which spintronic application is best suited for it. Such examples of this are magneto-optical characterisation, low temperature spin and electronic transport measurements. For the chosen material the symmetry can be exploited through varying composition which can influence band structure and spin charge conversion. Allowing for a greater understanding of the thin film and hence knowing its potential applications in the field of spinstronics.

为了跟上不断发展的计算能力，自旋电子器件的发展被引入。这些设备操纵电子的自旋而不是电荷。为了制造这样的设备，必须依赖具有精确微观结构的薄膜。此外，通过了解底层晶体结构的对称性，人们可以创建这些新设备并在电子自旋中编码信息。通过这样做，这些设备比当前技术更加节能。在这个项目中，我将在超高真空下使用物理气相沉积来创建薄膜，然后将其用于自旋电子应用。然而，首先将制造不同的材料，随着项目的持续时间，将分析特定的金属间材料。为了分析这些材料，将进行许多 X 射线衍射和 X 射线反射率测量。这将有助于了解薄膜的晶体结构，以便在物理气相沉积阶段对薄膜进行任何调整。不仅可以了解晶体结构，还可以找到表面粗糙度、密度和薄膜厚度。将专门研究材料的各种磁特性，以确定哪种自旋电子学应用最适合它。这样的例子有磁光表征、低温自旋和电子传输测量。对于所选材料，可以通过改变成分来利用对称性，这可以影响能带结构和自旋电荷转换。可以更好地了解薄膜，从而了解其在自旋电子学领域的潜在应用。