Development of new main group resists for electron beam lithography and direct writing of nanostructures

开发用于电子束光刻和纳米结构直接写入的新型主族抗蚀剂

• 批准号: 2905753
• 金额: --
• 依托单位: University of Manchester
• 依托单位国家: 英国
• 项目类别: Studentship
• 财政年份: 2023
• 资助国家: 英国
• 起止时间: 2023 至 无数据
• 项目状态: 未结题
• 来源: https://gtr.ukri.org/projects?ref=studentship-2905753
• 关键词: Development; new; main; group; resists

This research project will be focused on the preparation of main group compounds and complexes containing elements from both group 13, 14, 15 and 16. These complexes will then be cast into thin films and investigated in pattern fabrication using electron-beam lithography (EBL) and extreme ultraviolet (EUV) lithography. Incorporation of heavy group 14 and 15 elements into resists using these clusters is expected to drastically increase their write speed and thus their performance. This work lies at the interface of synthetic main group chemistry and the nanofabrication of electronic devices. We also believe this could be a route to direct writing of nanostructures in a way that is more sustainable that present technologies.The successful applicant will receive excellent training in the principles of solution phase coordination chemistry and synthetic solid-state techniques, specifically as applied to air-sensitive materials. On the materials side training in techniques for nanofabrication, including EBL. Training in characterisation tools such as X-ray crystallography, NMR spectroscopy and mass spectrometry will also be provided.

该研究项目将侧重于制备含有13、14、15和16族元素的主族化合物和配合物。然后将这些复合物浇铸成薄膜，并使用电子束光刻（EBL）和极紫外（EUV）光刻进行图案制造。使用这些簇将重族14和15元素掺入抗蚀剂中预期将显著提高其写入速度，从而提高其性能。本工作处于主族化学合成与电子器件纳米组装的接口。我们也相信这可能是一条直接写入纳米结构的途径，其方式比现有技术更可持续。成功的申请人将接受溶液相配位化学和合成固态技术原理的优秀培训，特别是应用于空气敏感材料。在材料方面，培训纳米制造技术，包括EBL。还将提供X射线晶体学、核磁共振光谱学和质谱法等表征工具方面的培训。