Fabrication of submicrometric vertically etched diffraction gratings

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This project aims at achieving vertically etched fused silica transmission gratings for optimalvisible/near-infrared signal dispersion with minimum zeroth order contribution. The treatment and analysis ofsuch optical signals address a problem of interest for O/E Land Inc., a company that manufactures advancedcomponents for fast and highly sensitive spectrometers, optical instruments and sensors, as well as opticalfibers for telecommunication. The proposed research is based on the implementation of plasma and ion-etchingtechniques to design gratings of etched depths varying between 0.2 and 1.0 µm for optimal first order signaldispersion and maximal optical transmission in the visible/NIR spectral range. These activities will beconducted at INRS in close collaboration with O/E Land's engineers, on fused silica substrates covered by athin Cr micrometric mask, which will be supplied by the company. After sample processing, both the depth andthe uniformity of the etched gratings will be investigated by scanning electron microscopy (SEM), atomic forcemicroscopy (AFM) and/or surface profilometry. The etching parameters will be varied to obtain uniform andparallel grooves with vertical edges. The diffractive optical elements produced during this project will be thenintegrated into O/E Land instruments, to be tested for specific uses in optical spectrometry and signalprocessing, thus ensuring an immediate technology transfer. The expected benefits of this project will allow thesupporting company to offer new products and reinforce its position in the area of optical instrumentation. Itwill give INRS the opportunity of consolidating its expertise in the fabrication and characterization of newadvanced optical components, for future collaborative projects with the private sector, and more particularlywith the Canadian optical industry.