空间光调制器中高透过低降解紫外液晶材料的设计与制备方法研究

紫外波段的液晶空间光调制器（LC-SLM）在无掩模光刻的强度调节和紫外光刻的波前调节等方面有着迫切的应用需求。但是，由于现有的液晶材料在紫外波段（248-400nm）具有高吸收率、不透光，且具有光降解性，导致现有LC-SLM无法达到紫外波段的应用要求。.本项目中，从液晶化合物的单元基团分子结构出发，选择低吸收基团进行液晶化合物的分子结构设计；采用分子轨道电子跃迁理论模拟计算液晶化合物的紫外吸收光谱特征，优化液晶分子设计；采用分子动力学理论模拟计算液晶化合物的液晶相范围、双折射率等参数，优化出有优良液晶性的分子结构；采用有机化学方法制备液晶化合物；采用光化学反应理论分析液晶及杂质的紫外光降解过程，用以避免减缓光降解。通过本项目的研究，将获得紫外波段LC-SLM的液晶材料方案。紫外LC-SLM具有多样化的调光能力，将为光刻、微纳元件加工等领域的研究和应用注入新的活力。

In maskless lithography system and ultraviolet lithography system, liquid crystal spatial light modulator (LC-SLM) in ultraviolet band is urgently demanded. However, LC-SLM can not be applied in the ultraviolet band because of high absorbence and photodegradation of liquid crystal material in the ultraviolet band (248-400 nm)..In this project, we will study the molecular structure of the unit group of liquid crystal compounds, low absorption groups are selected to design the molecular structure of liquid crystal compounds; the ultraviolet absorption spectrum characteristics of liquid crystal compounds are simulated and calculated by molecular orbital electron transition theory, and the molecular design of liquid crystal is optimized; the liquid crystal phase range and birefringence index of liquid crystal compounds are simulated and calculated by molecular dynamics theory, the molecular structure with excellent liquid crystal properties was optimized. Liquid crystal compounds were prepared by organic chemical method, and the ultraviolet degradation process of liquid crystal and impurities was analyzed by photochemical reaction theory to avoid slowing down the photodegradation. By the research of this project, the LC-SLM material scheme in ultraviolet band will be obtained. Ultraviolet LC-SLM has a variety of modulating capabilities, which will inject new vitality into the research and application of photolithography, micro-nano component processing and other fields.