高附着耐磨损CuInS2/TiO2光生阴极保护材料的构筑及作用机理研究

光生阴极保护材料与被保护体之间的附着力及耐摩擦磨损性能是目前光电化学阴极保护领域中急需解决的瓶颈问题。针对这一需求，采用磁控溅射技术制备TiO2，获得光电化学阴极保护性能优异的TiO2纳米材料；然后，将磁控溅射与水热法相结合制备CuInS2量子点对TiO2进行改性，获得表面附着力强且耐摩擦磨损性能好的CuInS2/TiO2光生阴极保护材料，为钢铁在金属抗腐蚀实际应用中提供更全面保护。.材料构筑过程中，探究磁控溅射与水热法过程变量对CuInS2/TiO2光生阴极保护性能的影响，提出光生阴极保护作用机理；阐明靶功率、沉积偏压及溅射时间对CuInS2/TiO2光生阴极保护材料表面附着力的调控机制；剖析CuInS2/TiO2相结构对耐摩擦磨损性能的调控机制。通过本项目实施，在光生阴极保护效果优异的基础上解决材料的附着力与摩擦磨损问题，为光生阴极保护领域中材料的改性和制备方法的选择提供科学依据。

The adhesion and friction and wear resistance between photogenerated cathodic protection materials and the protected material are the bottleneck problems that need to be solved urgently in the field of photochemical cathodic protection. In view of this requirement, TiO2 nanomaterials were prepared by magnetron sputtering technology, and the phase structure was transformed by heat treatment to obtain TiO2 nanomaterials with excellent photochemical cathodic protection performance; CuInS2 quantum dots were prepared by hydrothermal method and magnetron sputtering method to modify TiO2 nanomaterials, and CuInS2/TiO2 photogenerated cathodic protection materials with strong surface adhesion and good friction and wear resistance were obtained, which can provide more comprehensive protection effect for steel in the practical application of metal corrosion resistance..In the process of material construction, the influence of magnetron sputtering and hydrothermal process variables on the photogenerated cathodic protection performance of CuInS2/TiO2 nanomaterials were investigated, and propose the mechanism of photogenerated cathodic protection was proposed; and the regulation mechanisms of target power, deposition bias and sputtering time on the surface adhesion of CuInS2/TiO2 photogenerated cathodic protection materials are expounded; furthermore, analyze the regulation mechanism of CuInS2/TiO2 phase structure on friction and wear resistance was analyzed. Through the implementation of this research project, the problems of adhesion and friction and wear of materials can be solved on the basis of excellent photogenerated cathodic protection effect, which provides scientific basis for the selection of material modification and preparation methods in the field of photogenerated cathodic protection.