面向纳米尺度紧聚焦的级联超构透镜设计与应用研究

新型光场调控是纳米尺度光聚焦和无标记远场显微的重要技术基础。然而传统光场调控成像系统光路复杂、元件对准精度低、抗干扰能力差，所生成的极小焦斑的稳定性和光场质量亟待提高。为解决上述问题，本项目拟在前期开发的单晶硅超透镜超大数值孔径聚焦（Nano Lett. 2018，OPN 2018）、超大数值孔径成像透镜全性能设计（Optica 2019）及逆向自适应微纳结构设计等工作基础上，研制出具有纵向层叠结构的级联超构透镜，实现在微纳厚度上对紧聚焦光场的多参量调控，从而提高器件的集成度。通过多层单晶硅转移、光学粘合及电子束套刻等技术，使其层间对准精度达亚波长级，确保高质量矢量光场紧聚焦光斑的生成。此级联超构透镜还将结合共聚焦扫描技术，实现亚百纳米分辨率无标记远场成像。本项目开发的技术可有效提高紧聚焦矢量光场的空间光场调控能力，同时简化系统结构，可望促进极小尺度紧聚焦微纳光子器件的普及应用。

Tight focusing vector beams possess several extraordinary properties including symmetry energy distribution, ultra-small size, and strong longitudinal electric component. It is meaningful for novel light-mater interaction and far-field, non-intrusive nano-imaging. Nevertheless, the system is rather complicated with low alignment accuracy between each optical element, and external disturb such as vibration will destroy the stability of tight focusing. To avoid these disadvantages, we intend to study the integrated metasurface to achieve high-quality tight focusing vector beam. By using multilayer crystalline silicon transfer, optical adherence, and electron beam fabrication, the vertical alignment of each metasurfaces can be fabricated with accuracy down to a few nano-meters. This technique could simplify the architecture of the system and reduce the cost, as well as increase the stability of nano-imaging. We foresee that this technique is able to bloom the usage of highly integrated meta-photonic devices.