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基于场制固化及电荷俘获的低损耗高线性Si基GaN增强型射频功率器件研究

批准号:
62104184
项目类别:
青年科学基金项目(C类)
资助金额:
30.0 万元
负责人:
侯斌
依托单位:
学科分类:
半导体电子器件与集成
结题年份:
2024
批准年份:
2021
项目状态:
已结题
项目参与者:
侯斌

项目摘要

结项摘要

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中文摘要
面向电源调制器、5G射频前端组件对GaN增强型射频功率器件的需求,本项目将针对低射频损耗Si基GaN外延设计与生长技术,电荷俘获型增强型器件结构及线性度提升展开研究,实现高性能Si基GaN增强型射频功率器件的研制。探索Si基GaN外延材料的射频损耗来源,建立包含衬底、界面寄生沟道等特征损耗参数的等效电路模型,并采用低温脉冲法成核层生长技术降低射频损耗;基于电荷俘获技术实现对沟道载流子的无损调制,解决增强型器件高驱动与高阈值的矛盾问题,并结合准范德华外延理论与超低损伤热剥离技术,实现对俘获电荷的固化,解决其阈值稳定性问题;基于能带势阱调制载流子输运理论,采用两步法复合沟道生长方式,提升Si基GaN增强型器件的线性度。本项目在高性能Si基GaN增强型射频功率器件方面的研究具有重要科学意义,将拓宽GaN基增强型器件的应用领域,为手机终端等多功能微型系统的高度模组化、集成化提供有力的技术支撑。
英文摘要
For the demand of power supply modulator and RF Front-end for GaN-based normally-off devices, the project will focus on the design and growth technology of low-loss Si-based GaN epitaxial structure, the structure design and linearity improvement of charge trapping normally-off devices, so as to realize high performance Si-based GaN normally-off RF power devices. In this project, the equivalent circuit model including substrate, interface parasitic channels and other characteristic parameters accounting for RF Loss is built to explore its essential source, and a new nucleation growth technology achieved by low temperature pulse method is adopted to reduce RF Loss. Based on the technique of charge trapping, the lossless modulation of channel carriers is realized to resolve the principal contradiction between high threshold voltage (Vth) and strong drive ability in traditional GaN-based normally-off devices. In addition, the quasi Van Der Waals extension theory and the ultra-low damage thermal stripping technology are combined to realize the stabilization of the trapped charge and resolve the reliability issue of Vth stability for charge trapping devices. Utilizing the theory of energy band modulation and potential well storage, a two-step composite channel growth technology is adopted to improve the linearity of Si-based GaN normally-off devices. As a whole, the project has essential scientific significance in the research of high performance Si-based GaN normally-off devices, which will broaden the applications of GaN-based normally-off devices, and provide strong technical support for the highly modularization and integration for multi-functional microsystems especially the mobile terminals.
随着5G移动通讯以及未来6G用电信基础设施持续向低输出功率系统发展, RF GaN器件需要在提升性能的同时有效降低功耗水平。得益于更大的晶圆尺寸,更低的成本和优越的CMOS工艺兼容性,硅基GaN HEMT技术在移动终端、微基站以及大规模异构集成电路等应用中具有较好的应用前景。而且随着工艺技术的不断优化,硅基GaN HEMT器件在射频领域已经具有能够匹敌SiC基GaN器件的潜能,在毫米波段也有具有较好的射频功率特性,有效助力5G基站的实现。此外,为了在基站模块中成功运行异构集成电路模块,满足手机终端对正向供电的需求,实现系统的小型化设计而不增加额外的转换电路,一个高效、低功耗、大驱动能力的高性能硅基氮化镓增强型射频功率器件是优选方案,工作在正栅极偏置下的射频器件在降低电路复杂性和提高系统安全性方面颇有优势。通过本项目,硅基GaN增强型射频器件基础技术研究,促进基础和核心技术储备,使得我国在GaN高频低功耗器件领域能够紧跟并超越国际先进水平。本项目开展了Si基GaN射频损耗机制研究,建立了包含界面损耗机制AlN/Si体系的Si基GaN射频损耗模型,提出了低温脉冲式AlN成核层生长机制,实现了低射频损耗的Si基GaN外延材料生长模式,40GHz下射频损耗为1.1dB/mm;开展了射频用高晶格质量的Si基GaN缓冲层生长技术研究,完成了高晶格质量的射频用超薄、低翘曲Si基GaN异质结材料生长工艺的整合,结合低损伤栅下刻蚀技术,研制出Si基GaN增强型射频器件,器件在6V工作电压下,漏极效率高达73%,在35V工作电压下,输出功率密度为5.32W/mm;建立了基于堆栈式栅介质结构的Si基GaN电荷俘获型增强型器件阈值电压模型,研制的电荷俘获型器件结构阈值电压调控量为6.15V,200℃阈值电压漂移量为0.8%;开发了耦合沟道高线性技术,输出三阶交调截取点OIP3为39.3dBm。本项目在高性能Si基GaN增强型射频功率器件方面的研究具有重要科学意义,将拓宽GaN基增强型器件的应用领域,为手机终端等多功能微型系统的高度模组化、集成化提供有力的技术支撑。
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