Silicon nanopillars formed by reactive ion etching using a self-organized gold mask
Silicon nanopillars formed by reactive ion etching using a self-organized gold mask
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DOI：
10.1238/physica.topical.079a00263
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发表时间：
1999-01-01
期刊：
影响因子：
2.9
通讯作者：
Tuovinen, C
中科院分区：
文献类型：
--
作者：
Ovchinnikov, V;Malinin, A;Tuovinen, C
采用反应离子刻蚀法在含氟等离子体中制备了硅纳米柱。通过对薄的金箔进行原位加热，形成由金岛组成的自组织金掩膜。用扫描电镜对其结构进行了表征。
Silicon nanopillars were fabricated by using reactive ion etching in a fluorinated plasma at room temperature. A self-organized gold mask consisting of gold islands was formed by in situ heating of a thin gold him. Structures were characterized by scanning electron microscopy.