Deformation mechanism and punch taper effects on nanoimprint process by molecular dynamics
Deformation mechanism and punch taper effects on nanoimprint process by molecular dynamics
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DOI：
10.1143/jjap.43.7665
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发表时间：
2004-11-01
期刊：
影响因子：
--
通讯作者：
Fang, TH
中科院分区：
文献类型：
--
作者：
Hsu, QC;Wu, CD;Fang, TH
提出了一种分子动力学分析模型，研究了锥形角度、压印深度和回弹等参数对纳米压印过程的影响。纳米压印工艺包括一个冲头和一个处于400 K等温状态的试样，而变形的材料是铜fee单晶，冲头材料是镍fee单晶。铜中共有10，080个原子，长度和高度分别为12.02 nm和5.72 nm。在镍中总共有4，200个原子，在冲头齿中的典型长度和深度分别为6.24 nm和3.52 nm。采用基于哈密顿动力学、周期性边界条件和莫尔斯势函数的计算机模拟程序对纳米压印过程进行了模拟。通过改变冲头锥角和压印深度，获得了有关纳米压印过程的有用信息。
A molecular dynamics analysis model is proposed to study the effects of parameters on the nanoimprint process, for example, taper angle, imprint depth and spring back. The nanoimprint process comprises one punch and one specimen at an isothermal state of 400 K, while the deformed material is a copper fee single crystal and the punch material is a nickel fee single crystal. There were a total of 10,080 atoms in copper measuring 12.02 nm and 5.72 nm in length and height, respectively. There were a total of 4,200 atoms in nickel with a typical length and depth in a punch tooth of 6.24 nm and 3.52 nm, respectively. Computer simulation codes based on Hamiltonian dynamics, periodical boundary conditions and the Morse potential function were used to simulate the nanoimprint process. By varying the punch taper angle and the imprint depth, useful information about the nanoimprint process was obtained.