Element-specific hard x-ray diffraction microscopy
Element-specific hard x-ray diffraction microscopy
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DOI：
10.1103/physrevb.78.092105
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发表时间：
2008-09
影响因子：
3.7
通讯作者：
Yukio Takahashi;Hideto Kubo;H. Furukawa;K. Yamauchi;E. Matsubara;T. Ishikawa;Y. Nishino
中科院分区：
文献类型：
--
作者：
Yukio Takahashi;Hideto Kubo;H. Furukawa;K. Yamauchi;E. Matsubara;T. Ishikawa;Y. Nishino
首次证明了在硬X射线区域中使用异常X射线散射的元素特定的相干X射线成像技术。相干的X射线衍射图案的样品组成的500 nm厚的Ni和Cu层的测量在入射X射线能量周围的$\text{Ni}\text{ }K$吸收边。由于在硬X射线区域的异常散射现象，观察到非中心对称的衍射图案。通过使用Rytov近似数值模拟样品位置后面的X射线波场，定量分析了衍射图案的对称性。通过计算不同能量的重建图像的强度之间的差异，可以导出Ni层的图像，尽管这不足以精确地识别。该方法可广泛应用于厚样品和高Z值样品中纳米尺度元素分布的无损分析。
An element-specific coherent x-ray imaging technique using anomalous x-ray scattering in the hard x-ray region was first demonstrated. Coherent x-ray diffraction patterns of a sample composed of 500-nm-thick Ni and Cu layers were measured at incident x-ray energies around the $\text{Ni}\text{ }K$ absorption edge. Non-center-symmetric diffraction patterns due to anomalous scattering phenomenon in the hard x-ray region were observed. Symmetricity of the diffraction pattern was quantitatively analyzed by numerically simulating the x-ray wave field behind the sample position using the Rytov approximation. By calculating the difference between the intensities of reconstructed images of different energies, an image of the Ni layers could be derived although it was not enough to identify precisely. This method is widely applicable to nondestructive analysis of nanometer-scale elemental distribution of materials buried within thick and high-$Z$ samples.