Tunable reflection coating to reduce exposure power threshold for interference-assisted two-photon polymerization lithography
Tunable reflection coating to reduce exposure power threshold for interference-assisted two-photon polymerization lithography
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DOI：
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发表时间：
2023
影响因子：
2.3
通讯作者：
Xuan-Ming Duan
中科院分区：
文献类型：
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作者：
Xiang-Yu Zhao;Yuan-Yuan Zhao;Hai-Chao Luo;Xuan-Ming Duan
