Metal-ion doped luminescent thin films for optoelectronic applications
Metal-ion doped luminescent thin films for optoelectronic applications
复制标题
用于光电应用的金属离子掺杂发光薄膜
DOI：
10.1039/c3tc31024h
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发表时间：
2013-01-01
影响因子：
6.4
通讯作者：
Hao, Jianhua
中科院分区：
文献类型：
--
作者：
Zhang, Yang;Hao, Jianhua
一种类型的常用发光材料是所谓的金属离子掺杂磷光体。在这样的材料中，光学和发光特性可以由磷光体的主体和金属离子掺杂剂（镧系元素和过渡金属）控制。许多金属离子掺杂的发光材料可以制成薄膜的形式。这篇专题文章扼要综述这些材料的基本设计规则、合成方法（物理气相沉积法和化学法），以及掺金属离子的薄膜荧光粉的制造工艺的发展。我们提供了用于金属离子掺杂的薄膜磷光体的结构表征的各种技术的概述。金属离子掺杂的发光薄膜在光电子领域引起了广泛的兴趣，包括平板显示器、固态照明、光波导、太阳能电池和多功能应用。这些应用的一个关键问题是通过考虑不同于相应的体材料的薄膜结构的特定配置来提高发光效率。因此，影响薄膜荧光粉的发光性能的因素被确定。讨论了提高薄膜发光器件性能的一些策略。最后，在一些新兴领域的艺术状态进行了审查，并指出了未来的发展方向。
One type of commonly used luminescent material is so-called metal-ion doped phosphor. In such materials, optical and luminescent characteristics may be controlled by the host and metal-ion dopants (lanthanide and transition metal) of the phosphor. Many metal-ion doped luminescent materials can be made in the form of thin films. This feature article briefly reviews the development in the basic design rules of such materials, synthetic approaches (physical vapour deposition and chemical methods), and fabrication processes of metal-ion doped thin-film phosphors. We provide an overview of various techniques used for the structural characterization of metal-ion doped thin-film phosphors. Metal-ion doped luminescent thin films are attracting widespread interest in the optoelectronics field, ranging from flat-panel displays, solid-state lighting, optical waveguides, solar cells, and multifunctional applications. A critical issue for these applications is enhancing luminescence efficiency by considering the specific configuration of thin-film structure differing from the corresponding bulk material. Hence, the factors affecting luminescent properties of thin-film phosphors are identified. Some strategies in improving the performances of thin-film luminescent devices are discussed. Finally, the state of the art in some emerging fields is reviewed and future directions are indicated.