Extremely low coefficient of friction of diamond sliding against Ag thin films on Si(1 1 1) surface under ultrahigh vacuum condition
Extremely low coefficient of friction of diamond sliding against Ag thin films on Si(1 1 1) surface under ultrahigh vacuum condition
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超高真空条件下金刚石与Si(1 1 1)表面Ag薄膜滑动的极低摩擦系数
DOI：
10.1016/s0043-1648(02)00036-4
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发表时间：
2002
期刊：
影响因子：
5
通讯作者：
M. Uemura
中科院分区：
文献类型：
--
作者：
M. Goto;F. Honda;M. Uemura
利用销-板摩擦磨损试验机研究了金刚石（111）销在清洁的Si（111）基片上沉积的亚纳米厚Ag膜上的摩擦学性能。在10 - 8 Pa的超高真空（UHV）室中进行了Ag薄膜的制备和摩擦实验。摩擦实验在滑动速度为0.1mm/s和法向载荷为250 mN的条件下进行。一个非常低的摩擦系数，小于0.01，当针上滑动的银膜，其厚度为1和2.6单层（ML）的往复运动。Ag 1 ML薄膜的最小摩擦系数小于0.004。通过俄歇电子能谱（AES）和X射线光电子能谱（XPS）证实，在获得极低的摩擦系数后，Ag仍保留在磨痕上，没有转移到金刚石针上。极低的摩擦系数的机制进行了讨论的最上层的原子之间的化学键合力，和Ag覆盖在Si表面上。
The tribological properties of a diamond (111) pin slid on subnanometer thick Ag films, which were deposited on a cleaned Si(111) substrate, were studied using a pin-on-plate tribometer. The preparation of Ag ultrathin films and frictional experiments were performed in an ultrahigh vacuum (UHV) chamber at a pressure of 10−8Pa. The frictional experiments were carried out at a sliding speed of 0.1mm/s and at a normal load of 250 mN. An extremely low coefficient of friction, less than 0.01, was obtained when the pin was slid on Ag films, whose thicknesses were 1 and 2.6 monolayer (ML) under reciprocal motion. The minimum coefficient of friction was less than 0.004 for Ag 1ML film. After the extremely low coefficient of friction was obtained, Ag remained on the worn track without any transfer to the diamond pin, as confirmed by Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS). The mechanisms of extremely low coefficients of friction are discussed in terms of the chemical bonding force between atoms of the topmost layers, and Ag coverage on the Si surface.