Impact of carbon co-implantation on boron distribution and activation in silicon studied by atom probe tomography and spreading resistance measurements
Impact of carbon co-implantation on boron distribution and activation in silicon studied by atom probe tomography and spreading resistance measurements
复制标题
通过原子探针断层扫描和扩散电阻测量研究碳共注入对硅中硼分布和活化的影响
DOI：
10.7567/jjap.55.026501
复制
发表时间：
2016
影响因子：
1.5
通讯作者：
and Y. Nagai
中科院分区：
文献类型：
--
作者：
Y. Shimizu;H. Takamizawa;K. Inoue;F. Yano;S. Kudo;A. Nishida;T. Toyama;and Y. Nagai
