OH in vitreous silica: An atomic tunnelling state
OH in vitreous silica: An atomic tunnelling state
复制标题
二氧化硅玻璃中的 OH：原子隧道态
DOI：
10.1080/01418638108222344
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发表时间：
1981
期刊：
影响因子：
--
通讯作者：
W. Phillips
中科院分区：
文献类型：
--
作者：
W. Phillips
本文用OH基绕SiO键转动的模型分析和关联了石英玻璃中OH基性质的低温实验。在低温下，这是一个原子隧穿模型，但其中的参数是已知的，并且局部电位的分布函数可以从50 K以上的介电测量中推导出来。利用这些分布函数计算了OH对低温介电损耗、低频和高频介电常数真实的部分的温度变化、热容量、声衰减和热导率的影响。对于所有这些实验的计算和实验之间的协议是在50%以内，表明隧道模型可以提供一个一致的和合理的解释，在这种特定的情况下。对介质回波实验也作了详细分析，结果表明，隧道模是一种很好的介质回波。
Abstract The low-temperature experiments relating to the properties of the hydroxyl group OH in vitreous silica are analysed and correlated in terms of a model involving rotation of the OH group about an SiO bond. At low temperatures this is an atomic tunnelling model, but one in which the parameters are known, and for which the distribution functions for the local potentials can be deduced from dielectric measurements above 50 K. These distribution functions are used to calculate the effect of OH on the low-temperature dielectric loss, the temperature variation of the real part of the dielectric constant at low and high frequencies, the heat capacity, the acoustic attenuation and the thermal conductivity. For all these experiments the agreement between calculation and experiment is within 50%, indicating that the tunnelling model can provide a consistent and plausible explanation in this particular case. The dielectric echo experiments are also analysed in detail, and it is shown that the tunnelling mode...