Enhancement of pool boiling critical heat flux in dielectric liquids by microporous coatings
Enhancement of pool boiling critical heat flux in dielectric liquids by microporous coatings
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DOI：
10.1016/j.ijheatmasstransfer.2006.08.005
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发表时间：
2007-03-01
影响因子：
5.2
通讯作者：
You, Seung Mun
中科院分区：
文献类型：
--
作者：
Arik, Mehmet;Bar-Cohen, Avram;You, Seung Mun
本文报道了压力和过冷度对裸硅片加热器和涂有微孔层的硅片加热器池沸腾临界热流密度影响的实验研究。将双列直插式加热器组件浸入FC-72（一种介电流体）中，并在水平方向上进行实验，过冷度在0 K和72 K之间变化，压力在101.3 kPa和303.9 kPa之间。在3个大气压和近50 K的过冷度下，金刚石基微孔涂层硅加热器的最大CHF值达到47 W/cm（2），并且与未处理的硅表面相比，平均提高了约60%。一个可用的CHF相关性，与报告的标准偏差为12.5%的未经处理的表面在一个大范围的压力，过冷度，和表面条件，被证明是预测的压力和过冷度对CHF的影响，从表面增强芯片的标准偏差为12%。(c)2006爱思唯尔有限公司保留所有权利。
An experimental investigation into the effects of pressure and subcooling on the pool boiling critical heat flux from a bare silicon chip-like heater and from a silicon heater coated with microporous layers, is reported. The dual inline heater package was immersed in FC-72, a dielectric fluid, and the experiments were performed in the horizontal orientation, with subcooling varying between 0 K and 72 K, and the pressure between 101.3 kPa and 303.9 kPa. The maximum CHF values on the diamond-base microporous-coated silicon heater were found to reach 47 W/cm(2), at 3 atm and nearly 50 K of subcooling, and to provide an average enhancement of approximately 60% over the values attained with un-treated silicon surfaces. An available CHF correlation, with a reported standard deviation of 12.5% for untreated surfaces over a large range of pressures, subcoolings, and surface conditions, was shown to predict the pressure and subcooling effects on CHF from the surface-enhanced chip with a standard deviation of 12%. (c) 2006 Elsevier Ltd. All rights reserved.