Profile Control and Plasma Rotation by Biased Electrodes in Large Diameter RF Produced Plasma
Profile Control and Plasma Rotation by Biased Electrodes in Large Diameter RF Produced Plasma
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大直径射频产生等离子体中偏压电极的轮廓控制和等离子体旋转
DOI：
10.1143/jjap.38.4321
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发表时间：
1999
影响因子：
1.5
通讯作者：
Toshiro Yoshinaka
中科院分区：
文献类型：
--
作者：
S. Shinohara;N. Matsuoka;Toshiro Yoshinaka
等离子体轮廓的控制已经进行了使用三种类型的偏置电极在大直径（45厘米），射频（RF）产生的等离子体与磁场中的低压区域。电子密度的径向分布从空心变为尖峰，而电子温度分布没有明显变化。方位角旋转速度随着这种偏置而改变。它降低了与较低的磁场和/或在高压制度，并获得了几kHz的振荡的离子饱和电流的边缘区域附近的局部速度分布。
Control of the plasma profile has been carried out using three types of biased electrodes in a large-diameter (45 cm), radio-frequency (RF)-produced plasma with a magnetic field in the low-pressure region. The radial profile of the electron density changed from a hollow to a peaked one, while the electron temperature distribution did not appreciably change. The azimuthal rotation velocity was changed with this biasing. It decreased with a lower magnetic field and/or in a high-pressure regime, and a localized velocity profile near the edge region was obtained with a few kHz oscillation of the ion saturation current.