Surface Morphology and Crystal Structures of As-Grown BiSrCaCuO Thin Films Prepared by RF Magnetron Sputtering from Three Targets
Surface Morphology and Crystal Structures of As-Grown BiSrCaCuO Thin Films Prepared by RF Magnetron Sputtering from Three Targets
复制标题
三靶材射频磁控溅射制备 BiSrCaCuO 薄膜的表面形貌和晶体结构
DOI：
10.1143/jjap.28.1586
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发表时间：
1989
影响因子：
1.5
通讯作者：
K. Hamanaka
中科院分区：
文献类型：
--
作者：
K. Kuroda;K. Kojima;M. Tanioku;K. Yokoyama;K. Hamanaka
采用射频磁控溅射的方法，在650℃的温度下，在MgO（100）衬底上生长出了超导体BiSrCaCuO薄膜。底物在Bi3Sr2Ca2Cu3Ox、Bi2Sr3Ca3Cu3Ox和Bi2Sr2Ca2Cu4.5Ox三个靶标上旋转。通过调整基底在每个目标上的停留时间，可以精确控制薄膜的化学成分。本文描述了不同停留时间形成的溅射薄膜的超导性能、表面形貌和晶体结构。x射线衍射测试表明，通过改变停留时间可以改变晶体结构。具有最佳成分的薄膜在75 K时电阻率为零，表面非常光滑。该膜具有混合相，被认为是由高tc相和低tc相组成的堆叠结构。
As-grown superconducting BiSrCaCuO thin films were grown at 650°C on MgO(100) substrates by RF magnetron sputtering from three targets. The substrate was rotated over the three targets: Bi3Sr2Ca2Cu3Ox, Bi2Sr3Ca3Cu3Ox and Bi2Sr2Ca2Cu4.5Ox. By adjusting the staying time of the substrate over each target, it was possible to precisely control the chemical composition of the thin film. This paper describes the superconducting properties, surface morphology and crystal structures of sputtered films formed by varying the staying time. X-ray diffraction measurement showed that the crystal structure could be changed by varying the staying time. The film with the optimum composition showed zero resistivity at 75 K and had an exceedingly smooth surface. This film had the mixed phase which is considered to be a stacked structure consisting of a high-Tc phase and a low-Tc phase.