Microstructure and mechanical properties of AlCrN films deposited by CFUBMS
Microstructure and mechanical properties of AlCrN films deposited by CFUBMS
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CFUBMS 沉积 AlCrN 薄膜的微观结构和力学性能
DOI：
10.1016/j.surfcoat.2006.08.076
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发表时间：
2006
期刊：
影响因子：
--
通讯作者：
S. Y. Lee
中科院分区：
文献类型：
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作者：
Gwang;S. Y. Lee
本文采用垂直磁控源封闭场非平衡磁控溅射（CFUBMS）法制备了用于高温应用的Al1−xCrxN薄膜，并通过俄歇电子能谱（AES）、x射线衍射（XRD）、扫描电子显微镜（SEM）、原子力显微镜（AFM）、纳米压痕、划痕和磨损测试对其化学成分、晶体结构、形貌和力学性能进行了表征。此外，在600 - 1000°C的空气中退火30分钟后，通过硬度测量来评估薄膜的热稳定性。0.29≤X≤0.69的Al1−xCrxN薄膜形成三元固溶体，呈现fcc B1型结构的晶相，具有强（111）择优取向。根据Cr含量（X值）的不同，其硬度值在31 ~ 41 GPa之间，残余应力在−4.5 ~−5.6 GPa之间。与其他薄膜相比，富Al的Al1−xCrxN薄膜（X=0.29）的力学性能和热稳定性都有所提高。
In this paper, Al1−xCrxN films were synthesized by closed field unbalanced magnetron sputtering (CFUBMS) with vertical magnetron sources for high temperature applications and their chemical composition, crystalline structure, morphology and mechanical properties were characterized by Auger electron spectroscopy (AES), X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), nanoindentation, scratch and wear tests. Also, the thermal stability of the films was evaluated by hardness measurements after annealing treatments at temperatures between 600 and 1000 °C in air for 30 min. Al1−xCrxN films with 0.29≤X≤0.69 formed a ternary solid solution and exhibited the crystalline phases of fcc B1 type structure with strong (111) preferential orientation. Depending on the Cr content (X value), their hardness values were ranging from 31 to 41 GPa and the residual stresses were in the range of −4.5 to −5.6 GPa. In comparison to other films, the enhanced mechanical properties and thermal stability were observed from the Al rich Al1−xCrxN film (X=0.29).