Analytical and physical optimization of nanohole-array sensors prepared by modified nanosphere lithography
Analytical and physical optimization of nanohole-array sensors prepared by modified nanosphere lithography
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DOI：
10.1039/b808820a
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发表时间：
2008-01-01
期刊：
影响因子：
4.2
通讯作者：
Masson, Jean-Francois
中科院分区：
文献类型：
--
作者：
Murray-Methot, Marie-Pier;Menegazzo, Nicola;Masson, Jean-Francois
分析和物理性质的报道与掠射角沉积（GLAD）或等离子体处理的纳米球光刻（NSL）掩模制备的纳米孔阵列的沉积前的薄Au膜。使用原子力显微镜（AFM）表征用450 nm纳米球掩模获得的纳米孔阵列，以确定纳米孔的深度和宽度，以及纳米孔阵列的周期性。根据表面等离子体（SP）激发波长（500 nm至1000 nm）、对折射率的灵敏度（27 nm RIU（-1）至487 nm RIU（-1））、对单层形成的灵敏度（SP带偏移约100 nm）、对单层形成的灵敏度（27 nm RIU（-1）至487 nm RIU（-1））、对单层形成的灵敏度（27 nm RIU（-1）至487 nm RIU（-1））、对单层形成的灵敏度（1 nm）和折射率分辨率（10（-4）RIU）。这些简单的技术生产有序的纳米孔阵列与可调的分析和物理性能的生物传感器的发展。
The analytical and physical properties are reported for nanohole arrays prepared with glancing angle deposition (GLAD) or plasma treatment of a nanosphere lithography (NSL) mask prior to the deposition of a thin Au film. The nanohole arrays obtained with a 450 nm nanospheres mask are characterized using atomic force microscopy (AFM) to determine the depth and the width of the nanoholes, and the periodicity of the nanohole arrays. The analytical properties are reported in terms of the surface plasmon (SP) excitation wavelength (500 nm to 1000 nm), sensitivity to refractive index (27 nm RIU(-1) to 487 nm RIU(-1)), sensitivity to monolayer formation (shift of the SP band by approx. 1 nm), and refractive index resolution (10(-4) RIU). These simple techniques produce well-ordered nanohole arrays with tunable analytical and physical properties for the development of biosensors.