Decomposition of fluorocarbon gaseous contaminants by surface discharge induced plasma chemical processing
Decomposition of fluorocarbon gaseous contaminants by surface discharge induced plasma chemical processing
复制标题
通过表面放电诱导等离子体化学处理分解碳氟化合物气态污染物
DOI:
10.1109/28.231995
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发表时间:
1991
期刊:
影响因子:
--
通讯作者:
S. Masuda
中科院分区:
文献类型:
--
作者:
T. Oda;T. Takahashi;H. Nakano;S. Masuda
Surface discharge induced plasma chemical processing (SPCP) using a high-grade alumina-based cylindrical reactor with an embedded ground electrode and stripe-shaped surface metal electrodes was applied to decompose chlorofluorocarbon contaminants in air, nitrogen, and oxygen. A very high decomposition rate, more than 99%, was observed for 100 or 1000 p.p.m. CFC-113. Greater electric power is found to be necessary to decompose the chemically stable fluorocarbon, but a substantial further improvement of efficiency will be possible in the near future. The authors feel that this system will be effective to decompose dilute fluorocarbon in large quantities.<<ETX>>