Strong extreme ultraviolet emission from a double-stream xenon/helium gas puff target irradiated with a Nd:YAG laser
Strong extreme ultraviolet emission from a double-stream xenon/helium gas puff target irradiated with a Nd:YAG laser
复制标题
用 Nd:YAG 激光照射的双流氙气/氦气吹胀目标发出强烈的极紫外光
DOI：
10.1016/s0030-4018(00)00946-9
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发表时间：
2000
影响因子：
2.4
通讯作者：
S. Yamagami
中科院分区：
文献类型：
--
作者：
H. Fiedorowicz;A. Bartnik;H. Daido;I. Choi;Masayuki Suzuki;S. Yamagami
首次研究了新型双流喷气靶在Nd：YAG激光辐照下产生的8-18 nm波段极紫外辐射。通过使用双喷嘴装置将氙气流脉冲注入到来自氦气的中空气流中来形成靶。强EUV生产近11 nm的双流氙/氦目标超过铁，铜，锡固体目标的排放量进行了观察。这一新的结果可能有助于设计用于EUV光刻的激光产生辐射源。
Extreme ultraviolet (EUV) emission in the 8–18 nm wavelength range from a new double-stream gas puff target irradiated with a Nd:YAG laser has been studied for the first time. The target was formed by pulsed injection of a xenon gas stream into a hollow gas stream from helium by using a double-nozzle setup. Strong EUV production near 11 nm from the double-stream xenon/helium target exceeding emissions from iron, copper, and tin solid targets was observed. This new result may be useful to design a laser-produced radiation source for EUV lithography.