A 50nm spatial resolution EUV imaging-resolution dependence on object thickness and illumination bandwidth
A 50nm spatial resolution EUV imaging-resolution dependence on object thickness and illumination bandwidth
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DOI：
10.1364/oe.19.009541
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发表时间：
2011-05-09
期刊：
影响因子：
3.8
通讯作者：
Kostecki, Jerzy
中科院分区：
文献类型：
--
作者：
Wachulak, Przemyslaw W.;Bartnik, Andrzej;Kostecki, Jerzy
在本文中，我们报告了一个桌面显微镜达到50纳米的空间分辨率在非常紧凑的设置使用喷气激光等离子体EUV源。研究了物体的厚度和照明辐射的带宽，以估计它们对EUV显微镜空间分辨率的定量影响。为了研究带宽/物体厚度寄生效应对极紫外显微镜空间分辨率的影响，比较了不同厚度物体在可变带宽极紫外辐射照射下获得的极紫外图像的刀口空间分辨率。(C)2011年美国光学学会
In this paper we report a desk-top microscopy reaching 50nm spatial resolution in very compact setup using a gas-puff laser plasma EUV source. The thickness of an object and the bandwidth of illuminating radiation were studied in order to estimate their quantitative influence on the EUV microscope spatial resolution. EUV images of various thickness objects obtained by illumination with variable bandwidth EUV radiation were compared in terms of knife-edge spatial resolution to study the bandwidth/object thickness parasitic influence on spatial resolution of the EUV microscope. (C) 2011 Optical Society of America