Sulphur diffusion in silicate glass melts with particular reference to Schott AF45 glass
Sulphur diffusion in silicate glass melts with particular reference to Schott AF45 glass
复制标题
硅酸盐玻璃熔体中的硫扩散，特别参考肖特 AF45 玻璃
DOI：
--
复制
发表时间：
2007
期刊：
影响因子：
--
通讯作者：
T. Pfeiffer
中科院分区：
文献类型：
--
作者：
M. Szurman;G. Heide;G. H. Frischat;T. Pfeiffer
使用放射性示踪剂扩散法在工业贫碱铝硼硅酸钡玻璃熔体（AF 45，Schott AG）中测量了硫扩散与温度和氧分压的函数关系。在氧化性条件下，硫的扩散在900-1400°C范围内可用频率因子D 0 =（1.7 ± 0.2）× 10 - 4 m2/s和活化能Q=258±10 kJ/mol来描述;在还原性条件下，用频率因子D 0 =（3.6 ± 0.6）× 10 - 4 m2/s和活化能Q=257±16 kJ/mol来描述。弱的PO 2依赖性与相同的活化能一起表明，传输机制是相似的。此外，虽然硫扩散和粘性流之间的相关性被发现有没有联系的扩散控制物种。因此，有人建议，网络耦合的运输机制适用于这些不同的氧化还原条件，类似于网络氧运输的机制。
Sulphur diffusion as a function of temperature and oxygen partial pressure was measured in a technical alkali-poor barium alumoborosilicate glass melt (AF45, Schott AG) using the radioactive tracer diffusion method. Under oxidising conditions sulphur diffusion could be described for temperatures between 900-1400°C using a frequency factor D 0 =(1·7±0·2)x10 -4 m 2 /s and an activation energy Q=258±10 kJ/mol, whereas under reducing conditions the values were found to be D 0 =(3·6±0·6)x10 -4 m 2 /s and Q=257±16 kJ/mol. The weak P o2 dependence together with the identical activation energies indicates that the transport mechanisms are similar. Furthermore, although a correlation between sulphur diffusion and viscous flow was found there was no link to the diffusion controlling species. Thus, it is suggested that network coupled transport mechanisms apply to these different redox conditions, similar to the mechanism of network oxygen transport.