The structure and properties of chromium diboride coatings deposited by pulsed magnetron sputtering of powder targets
The structure and properties of chromium diboride coatings deposited by pulsed magnetron sputtering of powder targets
复制标题
DOI：
10.1016/j.surfcoat.2005.08.022
复制
发表时间：
2005-11
影响因子：
5.4
通讯作者：
M. Audronis;P. Kelly;R. Arnell;A. Leyland;A. Matthews
中科院分区：
文献类型：
--
作者：
M. Audronis;P. Kelly;R. Arnell;A. Leyland;A. Matthews
金属硼化物涂层越来越受到人们的关注，因为它们结合了高硬度和良好的耐磨性和耐腐蚀性。这些涂层通常通过热压或烧结陶瓷靶材的溅射来沉积。然而，这种性质的靶材容易破裂，并且由于用户仅限于每个靶材的单一成分，因此不提供容易改变薄膜化学计量的机会。硼化钛和硼化锆已被广泛研究；然而，二硼化铬被认为在腐蚀磨损环境中具有卓越的性能。因此，在这项研究中，CrB2 涂层是通过脉冲磁控溅射松散填充的混合粉末靶材来沉积的。这项工作是在专门为使用粉末靶材而设计的沉积系统中进行的，这种方法的有效性之前已通过生产多种不同的多组分涂层材料得到了证明。沉积的 CrB2 涂层表现出极其致密、无缺陷的晶体结构，具有高硬度 (>30 GPa) 和良好的耐腐蚀性能。本文讨论了此类涂层的结构、机械性能和腐蚀行为对所选直流脉冲等离子体处理条件的依赖性。
Metal boride coatings are attracting increased interest, due to the fact that they combine high hardness with good wear and corrosion resistance. These coatings are often deposited by the sputtering of hot-pressed or sintered ceramic targets. However, targets of this nature can be prone to cracking and, since the user is limited to a single composition per target, do not offer the opportunity to readily vary film stoichiometry. Titanium and zirconium borides have been widely studied; however, chromium diboride is recognised as offering superior performance in corrosive-wear environments. In this study, therefore, CrB2coatings were deposited by the pulsed magnetron sputtering of loosely packed blended powder targets. This work was carried out in a deposition system specifically designed for the use of powder targets, and the effectiveness of this approach has been previously demonstrated through the production of a number of different multi-component coating materials. The CrB2coatings deposited exhibit extremely dense, defect-free, crystalline structures with high hardness (>30 GPa) and good corrosion resistant properties. This paper discusses the dependence of structure, mechanical properties and corrosion behaviour of such coatings on the DC pulsed plasma treatment conditions chosen.