Grey scale electron-beam lithography in functionalized SU-8 for active optical devices
Grey scale electron-beam lithography in functionalized SU-8 for active optical devices
复制标题
用于有源光学器件的功能化 SU-8 中的灰度电子束光刻
DOI：
10.1117/12.641213
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发表时间：
2006
影响因子：
6.9
通讯作者：
Anders Kristensen
中科院分区：
文献类型：
--
作者：
S. Balslev;T. Rasmussen;P. Shi;Anders Kristensen
利用灰度电子束光刻技术，在功能化SU-8 2000抗蚀剂中掺杂罗丹明6 G激光染料，实现了小型化单模聚合物染料激光器。这些器件提供了在基于聚合物的芯片实验室微系统中容易集成单模激光源的可能性。所演示的激光器件由一个平面波导与一阶分布反馈光栅（DFB）表面的反射，形成一个光学谐振腔。当在532 nm处光泵浦时，在570 nm - 630 nm的波长范围内获得单模激射，这由光栅周期决定。我们的研究结果表明，先进的纳米结构的有源光学元件的快速成型工艺的可行性。
Miniaturized, single mode polymer dye lasers are realized by means of grey scale electron beam lithography (EBL) in functionalized SU-8 2000 resist, doped with Rhodamine 6G laser dye. These devices offer the possibility of easy integration of single mode laser sources in polymer based lab-on-a-chip microsystems. The demonstrated laser device consists of a planar waveguide with a 1st-order distributed feedback grating (DFB) surface corrugation, which forms an optical resonator. When optically pumped at 532 nm, single mode lasing is obtained in the wavelength range 570 nm - 630 nm, determined by the grating period. Our results demonstrate the feasibility of fabricating advanced nano-structured active optical components in a rapid prototyping process.