PHYSIOLOGICAL-PROPERTIES OF A PSEUDOMONAS STRAIN WHICH GROWS WITH PARAXYLENE IN A 2-PHASE (ORGANIC-AQUEOUS) MEDIUM
PHYSIOLOGICAL-PROPERTIES OF A PSEUDOMONAS STRAIN WHICH GROWS WITH PARAXYLENE IN A 2-PHASE (ORGANIC-AQUEOUS) MEDIUM
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DOI：
10.1128/aem.58.9.2723-2729.1992
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发表时间：
1992-09-01
影响因子：
4.4
通讯作者：
GIBSON, DT
中科院分区：
文献类型：
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作者：
CRUDEN, DL;WOLFRAM, JH;GIBSON, DT
当甲苯、间二甲苯、对二甲苯、1,2,4-三甲苯和 3-乙基甲苯以 5 至 50% (vol/vol) 的浓度提供在两相系统中时，恶臭假单胞菌爱达荷州 (Pseudomonas putida Idaho) 使用这些烃作为生长底物。在存在多种有机溶剂的情况下，Luria-Bertani 培养基上也会发生生长。生物体在有机溶剂存在下生长的能力与辛醇-水分配系数的对数相关，其中邻苯二甲酸二甲酯（log P(OCT) = 2.3）是最耐受的极性溶剂。在使用对二甲苯（20% [vol/vol]）生长期间，存在一个伴随着细胞死亡的初始滞后期，随后是指数生长期。生长稳定期的特点是细胞活力急剧下降，尽管细胞干重和浊度测量值缓慢增加。电子显微照片显示，在对二甲苯存在的情况下生长期间，外细胞膜变得卷曲并且膜碎片脱落到培养基中。同时，细胞质膜内陷，形成囊泡，并变得杂乱无章。在使用对二甲苯 (20% [vol/vol]) 和对二甲苯蒸气生长的细胞中观察到电子致密的细胞内包涵体，而在使用琥珀酸盐生长的细胞中则不存在这种情况。证明爱达荷州恶臭假单胞菌中存在质粒 DNA 的尝试是否定的。然而，极谱研究表明，该生物体利用与含有 TOL 质粒 pWWO 的恶臭假单胞菌 mt-2 相同的途径降解甲苯、间二甲苯和对二甲苯。 Southern杂交实验表明恶臭假单胞菌爱达荷州含有与TOL质粒pWWO中上部操纵子的编码基因同源的DNA区域。
Pseudomonas putida Idaho utilizes toluene, m-xylene, p-xylene, 1,2,4-trimethylbenzene, and 3-ethyltoluene as growth substrates when these hydrocarbons are provided in a two-phase system at 5 to 50% (vol/vol). Growth also occurs on Luria-Bertani medium in the presence of a wide range of organic solvents. The ability of the organism to grow in the presence of organic solvents is correlated with the logarithm of the octanol-water partition coefficient, with dimethylphthalate (log P(OCT) = 2.3) being the most polar solvent tolerated. During growth with p-xylene (20% [vol/vol]), there was an initial lag period accompanied by cell death, which was followed by a period of exponential growth. The stationary phase of growth was characterized by a dramatic decrease in cell viability, although cell dry weight and turbidity measurements slowly increased. Electron micrographs revealed that during growth in the presence of p-xylene, the outer cell membrane becomes convoluted and membrane fragments are shed into the culture medium. At the same time, the cytoplasmic membrane invaginates, forming vesicles, and becomes disorganized. Electron-dense intracellular inclusions were observed in cells grown with p-xylene (20% [vol/vol]) and p-xylene vapors, which are not present in cells grown with succinate. Attempts to demonstrate the presence of plasmid DNA in P. putida Idaho were negative. However, polarographic studies indicated that the organism utilizes the same pathway for the degradation of toluene, m-xylene, and p-xylene as that used by P. putida mt-2 which contains the TOL plasmid pWWO. Southern hybridization experiments showed that P. putida Idaho contains regions of DNA that are homologous to genes encoding enzymes of the upper operon in the TOL plasmid pWWO.