Visible-laser ablation on a nanometer scale using urethane–urea copolymers
Visible-laser ablation on a nanometer scale using urethane–urea copolymers
复制标题
使用聚氨酯-脲共聚物进行纳米级可见激光烧蚀
DOI：
10.1016/s0030-4018(98)00411-8
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发表时间：
1998
期刊：
影响因子：
--
通讯作者：
N. Okamoto
中科院分区：
文献类型：
--
作者：
C. Egami;Y. Kawata;Y. Aoshima;H. Takeyama;F. Iwata;O. Sugihara;M. Tsuchimori;O. Watanabe;H. Fujimura;N. Okamoto
我们报告了含有偶氮染料的聚氨酯-脲共聚物的可见激光烧蚀。共聚物膜上的烧蚀深度与入射激光能量成正比。在非常低的光束能量（∼2 J/cm2）下确保了纳米级深度/能量转换的线性。全息光栅的形成被证明作为该特性的应用示例。通过引入两束相干激光束，可以在聚合物薄膜表面轻松制作出振幅为 40 nm 的正弦光栅。共聚物中光栅形成的主要机制不是由于压力梯度导致的共聚物链的传质，而是共聚物的蒸发。通过石英晶体微天平（QCM）方法观察与聚合物蒸发相关的质量减少。
We report visible-laser ablation of a urethane–urea copolymer containing an azo dye. The ablated depth on the copolymer film was proportional to incident laser energy. The linearity of a depth/energy conversion on a nanometer scale was ensured at very low beam energy (∼2 J/cm2). Holographic grating formation was demonstrated as an example of application of this property. A sinusoidal grating with 40-nm amplitude was easily fabricated on the surface of the polymer film by introducing two coherent laser beams. The main mechanism of grating formation in the copolymer was not mass transport of copolymer chains due to pressure gradients but evaporation of the copolymer. Mass reduction associated with polymer evaporation was observed by means of the Quartz Crystal Microbalance (QCM) method.