Mid-infrared optical properties of thin films of aluminum oxide, titanium dioxide, silicon dioxide, aluminum nitride, and silicon nitride
Mid-infrared optical properties of thin films of aluminum oxide, titanium dioxide, silicon dioxide, aluminum nitride, and silicon nitride
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DOI：
10.1364/ao.51.006789
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发表时间：
2012-10-01
期刊：
影响因子：
1.9
通讯作者：
Masselink, W. Ted
中科院分区：
文献类型：
--
作者：
Kischkat, Jan;Peters, Sven;Masselink, W. Ted
本文研究了几种常见介电材料薄膜的复折射率分量n和k随中红外（MIR）波长在1.54-14.29 μ m（700-6500 cm（-1））范围内的波长和化学计量的函数关系。材料氧化硅，氮化硅，氧化铝，氮化铝，和氧化钛的制备使用室温反应溅射沉积，其特征在于使用MIR可变角光谱椭偏。研究表明，折射率函数是如何敏感的O-2和N-2的流量，以及生长条件的材料存款均匀。它还允许得出关于无定形和粗糙程度的结论。为了便于将本工作中沉积的材料与其他材料进行比较，还确定了折射率，并提供了近红外和可见光谱范围。这里提出的结果应作为一个有用的信息基础，设计光学薄膜的电磁波谱的MIR部分。结果被参数化，使他们能够很容易地用于涂层设计。(C)2012美国光学学会
The complex refractive index components, n and k, have been studied for thin films of several common dielectric materials with a low to medium refractive index as functions of wavelength and stoichiometry for mid-infrared (MIR) wavelengths within the range 1.54-14.29 mu m (700-6500 cm(-1)). The materials silicon oxide, silicon nitride, aluminum oxide, aluminum nitride, and titanium oxide are prepared using room temperature reactive sputter deposition and are characterized using MIR variable angle spectroscopic ellipsometry. The investigation shows how sensitive the refractive index functions are to the O-2 and N-2 flow rates, and for which growth conditions the materials deposit homogeneously. It also allows conclusions to be drawn on the degree of amorphousness and roughness. To facilitate comparison of the materials deposited in this work with others, the index of refraction was also determined and provided for the near-IR and visible ranges of the spectrum. The results presented here should serve as a useful information base for designing optical coatings for the MIR part of the electromagnetic spectrum. The results are parameterized to allow them to be easily used for coating design. (C) 2012 Optical Society of America