Refractive index variation of amorphous Ta2O5 film fabricated by ion beam sputtering with RF bias power
Refractive index variation of amorphous Ta2O5 film fabricated by ion beam sputtering with RF bias power
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射频偏压离子束溅射非晶Ta2O5薄膜的折射率变化
DOI：
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发表时间：
2009
期刊：
影响因子：
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通讯作者：
S. Chao
中科院分区：
文献类型：
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作者：
C. Huang;Hao;Y. P. Tsai;Wei Kai Chen;S. Chao
采用离子束溅射法制备Ta2O5薄膜，并在衬底上施加射频偏压。在可见光范围内的薄膜的折射率可以被控制成随RF偏置功率线性变化，同时保持低吸收。
Ta2O5 film was fabricated by ion beam sputtering with RF bias applied to the substrate. The refractive index in the visible range of the film can be controlled to vary linearly with the RF bias power while low absorption is maintained.