低温 (25-80°C) フェライトめっきによるスピネル型 ((Fe, M)3O4, M=Fe, Co, Ni, and Zn) 磁性膜の作製
低温 (25-80°C) フェライトめっきによるスピネル型 ((Fe, M)3O4, M=Fe, Co, Ni, and Zn) 磁性膜の作製
复制标题
低温（25-80℃）铁氧体电镀制备尖晶石型（（Fe，M）3O4，M=Fe，Co，Ni，Zn）磁性薄膜
DOI：
10.3379/jmsjmag.25.879
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发表时间：
2001
影响因子：
--
通讯作者：
正紀 阿部
中科院分区：
文献类型：
--
作者：
一寛 西村;伸広 松下;正紀 阿部
在25、50和80°C下，以FeCl 2 + MCl 2水溶液和NaNO 2 + CH 3COONH 4 + NH3氧化溶液为原料，采用铁氧体镀法制备了尖晶石型（Fe 3-xMxO 4，M=Fe、Co、Ni和Zn）多晶薄膜。对于磁铁矿（Fe 3 O 4），随着温度从80°C降低到25°C，获得单相Fe 3 O 4的反应溶液的pH从6.8增加到8.4，并且膜沉积的最大速率从13.3 nm/min降低到2.3 nm/min。对于Fe 3-xMxO 4，随着温度从90°C降低到25°C，[x in film] / [x in reaction solution]的比值从M = Co和Ni增加，而M = Zn减小。这可以用M离子的吸附速率对pH值的依赖性来解释，pH值随着温度的变化而变化。所有的薄膜的饱和磁化强度，与散装样品相比，毫不逊色。
Spinel-type (Fe3-xMxO4, M=Fe, Co, Ni, and Zn) polycrystalline films were synthesized by ferrite plating at 25, 50, and 80°C from an aqueous solution of FeCl2 + MCl2 mixed with an oxidizing solution of NaNO2 + CH3COONH4 + NH3. For magnetite (Fe3O4), as the temperature was decreased from 80°C to 25°C, the pH of the reaction solution to obtain single-phase Fe3O4 increased from 6.8 to 8.4, and the maximum rate of film deposition decreased from 13.3 nm/min to 2.3 nm/min. For Fe3-xMxO4, as the temperature was decreased from 90°C to 25°C, the ratio [x in film] / [x in reaction solution] increased from M = Co and Ni, while decreasing for M = Zn. This is explained by the dependence of the adsorption rate of M ions on the pH, which changes as the temperature changes. All the films had saturation magnetizations that compared favorably with those of bulk samples.