Tantalum-doped hydroxyapatite thin films: Synthesis and characterization
Tantalum-doped hydroxyapatite thin films: Synthesis and characterization
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DOI：
10.1016/j.actamat.2012.02.024
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发表时间：
2012-05-01
期刊：
影响因子：
9.4
通讯作者：
Snyders, R.
中科院分区：
文献类型：
--
作者：
Ligot, S.;Godfroid, T.;Snyders, R.
为了获得良好的生物活性，磁控溅射(MS)羟基磷灰石(HA)涂层必须是化学计量比和结晶的。也有人提出，在HA中掺杂金属元素可以提高其生物活性，但往往会降低其杨氏模量。因此，仍需努力寻找合适的生长条件、良好的掺杂元素，并最终生长掺杂的HA薄膜。在第一次尝试中，我们用MS合成了HA薄膜，我们的条件使我们能够在类似于10 nm min(-1)的化学计量比和结晶的HA涂层中生长，呈现出强烈的纹理。考虑到材料在强电子和离子轰击下的竞争生长，对后者进行了讨论。在确定Ta是一种很有前途的掺杂元素的从头计算的基础上，我们研究了磁控共溅射Ta掺杂羟基磷灰石(HA：Ta)的生长过程。HA：Ta薄膜被原位晶化。我们的数据显示，对于Ta含量
To achieve a good bioactivity, magnetron-sputtered (MS) hydroxyapatite (HA) coatings have to be stoichiometric and crystalline. It has also been suggested that doping HA with metallic elements improves its bioactivity but frequently reduces its Young's modulus. Therefore, efforts are still necessary to identify adequate growth conditions, good doping elements and finally to grow doped HA films. In a first attempt, HA films have been synthesized by MS. Our conditions enabled us to grow at similar to 10 nm min(-1) stoichiometric and crystallized HA coatings that presented a strong texture. The latter is discussed in view of the competitive growth of the material under the strong electron and ion bombardments used here. Based on ab initio calculations identifying Ta as a promising doping element, we then investigated the growth of Ta-doped hydroxyapatite (HA:Ta) by magnetron co-sputtering. The HA:Ta films were in situ crystallized. Our data reveals that for Ta contents