Spectroscopic ellipsometric scatterometry: sources of errors in critical dimension control
Spectroscopic ellipsometric scatterometry: sources of errors in critical dimension control
复制标题
光谱椭偏散射测量：关键尺寸控制中的误差来源
DOI：
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发表时间：
2003
期刊：
影响因子：
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通讯作者：
O. Lartigue
中科院分区：
文献类型：
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作者：
J. Hazart;G. Grand;P. Thony;David Hérisson;S. Garcia;O. Lartigue
This numerical study focused on the errors that can occur when ellipsometric spectroscopic scatterometry programs are used for critical dimension (CD) control and other significant geometrical parameters. The role of the number of wavelengths, the measurements noise and the spectral range is analyzed in terms of CD precision. Conversely, an important part is devoted to the effect of a bad shaping modelling of the lines (corner rounding, foot and notch effects) and bad characterization of the index. We show that the scatterometry technique is very resistant to measurement noise, even for a small number of wavelengths, although the spectral range has an important role on the CD calculation. We also give quantitative data about the accuracy needed on refractive index of the diffracting material must. Excepted for profiles with additional feet, the CD found is very close to the original line without geometrical defects (corner rounding and notches).
