Localized Removal of a Photoresist by Atmospheric Pressure Micro-plasma Jet Using RF Corona Discharge
Localized Removal of a Photoresist by Atmospheric Pressure Micro-plasma Jet Using RF Corona Discharge
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DOI：
10.1143/jjap.41.5797
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发表时间：
2002-09
影响因子：
1.5
通讯作者：
H. Yoshiki;Kazutake Taniguchi;Y. Horiike
中科院分区：
文献类型：
--
作者：
H. Yoshiki;Kazutake Taniguchi;Y. Horiike
使用RF（13.56 MHz）电晕放电在内径为0.4-0.5 mm且长度为19-25 mm的不锈钢手术针的尖端处产生大气压微等离子体射流（μ-PJ）。He µ-PJ以小于10 W的功率喷射到自由空间。的He原子激发温度（Texc）估计通过光学发射光谱的装置是3270 K，在350 sccm的气体流量和Texc随气体流量的增加而下降。O2 µ-PJ也以12 W的功率产生，并应用于光刻胶的局部去除。
Atmospheric pressure micro-plasma jet (µ-PJ) was generated at the tip of a stainless steel surgical needle with an inner diameter of 0.4–0.5 mm and with a length of 19–25 mm using RF (13.56 MHz) corona discharge. The He µ-PJ spouted to a free space at a power of less than 10 W. The He atomic excitation temperature (Texc) estimated by means of an optical emission spectrum was 3270 K at a gas flow rate of 350 sccm and Texc decreased with increasing gas flow rate. The O2 µ-PJ was also generated at a power of 12 W and it was applied to the localized removal of a photoresist.