At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems.
At-wavelength, system-level flare characterization of extreme-ultraviolet optical systems.
复制标题
极紫外光学系统的波长、系统级耀斑表征。
DOI：
10.1364/ao.39.002941
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发表时间：
2000
期刊：
影响因子：
1.9
通讯作者：
J. Bokor
中科院分区：
文献类型：
--
作者：
P. Naulleau;K. Goldberg;E. Gullikson;J. Bokor
极紫外（EUV）相移点衍射干涉仪（PS/PDI）最近被开发出来，以提供高精度的波前表征EUV光刻系统的发展至关重要。在这里，我们描述了PS/PDI的增强实现方式，其显著地扩展了其测量带宽。增强的PS/PDI能够同时表征波前和耀斑。提出了两个最近制造的EUV 10倍缩减光刻光学系统的基于PS/PDI的耀斑表征。
The extreme-ultraviolet (EUV) phase-shifting point-diffraction interferometer (PS/PDI) has recently been developed to provide high-accuracy wave-front characterization critical to the development of EUV lithography systems. Here we describe an enhanced implementation of the PS/PDI that significantly extends its measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wave front and flare. PS/PDI-based flare characterization of two recently fabricated EUV 10x-reduction lithographic optical systems is presented.