High repetition rate pulsed nozzle beam source
High repetition rate pulsed nozzle beam source
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高重复率脉冲喷嘴光束源
DOI：
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发表时间：
1982
期刊：
影响因子：
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通讯作者：
J. Valentini
中科院分区：
文献类型：
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作者：
J. B. Cross;J. Valentini
介绍了一种高重复频率压电脉冲分子束源。在脉冲宽度为100 μs ~ 10 ms的条件下，获得了高达750 Hz的膨胀速率，测量的膨胀特性与理想等熵膨胀特性非常接近。该阀非常可靠：我们已经获得了107次脉冲而没有出现故障。
A high repetition rate piezoelectric pulsed molecular beam source is described. Reptition rates as high as 750 Hz have been obtained with gas pulse widths from 100 μs to 10 ms. The measured expansion characteristics are very nearly those of an ideal isentropic expansion. The valve is highly reliable: We have obtained 107 pulses without failure.