Topside Plasma Scale Height Modelling Based on CHAMP Measurements: First Results
Topside Plasma Scale Height Modelling Based on CHAMP Measurements: First Results
复制标题
基于 CHAMP 测量的上部等离子秤高度建模：初步结果
DOI：
10.1007/3-540-26800-6_72
复制
发表时间：
2005
影响因子：
1.9
通讯作者：
N. Jakowski
中科院分区：
文献类型：
--
作者：
S. Stankov;N. Jakowski
本文介绍了利用CHAMP电离层掩星观测反演、分析和模拟上层等离子体尺度高度的初步结果。电离层f2层密度峰值上方区域的等离子体尺度高度值对于基于GPS掩星测量的TEC计算和等离子体密度重建程序非常重要。根据累积的1年时间序列资料，得到了上层等离子体尺度高度的纬度、日、季节变化。考虑到不断增长的CHAMP测量数据库，有可能开发一个新的经验模型，通过提供改进的上层电子密度剖面的初始猜测，用于改进电子密度剖面检索过程。
Presented are first results in retrieving, analysing, and modelling the topside plasma scale height by using CHAMP ionospheric radio occultation observations. The plasma scale height value in the region situated immediately above the ionospheric F2-layer density peak, is very important for the TEC calculation and plasma density reconstruction procedures based on GPS radio occultation measurements. Based on the year-long time series data accumulated so far, obtained were latitudinal, diumal, and seasonal variations of the topside plasma scale height. Considering the growing CHAMP measurement data base, it is possible to develop a new empirical model to be used for improving the process of electron density profile retrieval by delivering an improved initial guess of the topside electron density profile.