Prediction of hysteresis disappearance in the adsorption isotherm of N2 on regular mesoporous silica
Prediction of hysteresis disappearance in the adsorption isotherm of N2 on regular mesoporous silica
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DOI：
10.1021/la971256u
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发表时间：
1998-05-26
期刊：
影响因子：
3.9
通讯作者：
Kaneko, K
中科院分区：
文献类型：
--
作者：
Inoue, S;Hanzawa, Y;Kaneko, K
采用考虑分子-表面相互作用的热力学Saam-Cole方法解释了Nz在规则介孔二氧化硅上吸附滞后消失的临界孔宽。冷凝和蒸发时的孔壁上的物理吸附层的临界厚度的差异与孔壁的粗糙度固有的原子结构，显示的吸附滞后消失的临界孔宽度是在3.6至3.8 nm的范围内。
The thermodynamic Saam-Cole approach including the molecule-surface interaction was applied to explain the critical pore width at which the adsorption hysteresis of Nz on regular mesoporous silica disappears. The difference of the critical thickness of physisorbed layers on the pore wall upon condensation and evaporation was associated with the pore wall roughness inherent to the atomic structures, showing that the critical pore width for the disappearance of the adsorption hysteresis is in the range of 3.6 to 3.8 nm.