Microstructure and magnetic properties of oxidized titanium nitride thin films in situ grown by pulsed laser deposition
Microstructure and magnetic properties of oxidized titanium nitride thin films in situ grown by pulsed laser deposition
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DOI：
10.1088/0022-3727/46/7/075002
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发表时间：
2013-02
期刊：
影响因子：
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通讯作者：
S. C. Chen;K. Sung;W. Tzeng;K. Wu;J. Juang;T. Uen;C. Luo;J. Lin;T. Kobayashi;H. Kuo
中科院分区：
文献类型：
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作者：
S. C. Chen;K. Sung;W. Tzeng;K. Wu;J. Juang;T. Uen;C. Luo;J. Lin;T. Kobayashi;H. Kuo
以TiN为靶材，采用脉冲激光沉积技术，在不同氧压下制备了不同氧化态的氮化钛薄膜，包括纯TiN（h 0 0）、TiN1−xOx（h 0 0）、Ti2O3（0 0 l）和纯锐钛矿TiO2（0 0 l）。通过x射线衍射和x射线吸收光谱系统地研究了所获得薄膜的晶体和电子结构的详细演变。我们发现在氧气压力下制备的Ti2O3（0 0 l）薄膜表现出最大的室温铁磁性（RTFM）行为。利用束缚磁极化子模型阐明了这些薄膜中RTFM的来源。
Different oxidation states of titanium nitride thin films, including pure TiN(h 0 0), TiN1−xOx(h 0 0), Ti2O3(0 0 l) and pure anatase TiO2(0 0 l), were prepared by pulsed laser deposition with various oxygen pressures using a TiN target. Elaborative evolutions of the crystal and electronic structures of the obtained films were examined systematically by x-ray diffraction and x-ray absorption spectroscopy. We found that the Ti2O3(0 0 l) film, which was prepared at oxygen pressures , exhibited the maximum room temperature ferromagnetism (RTFM) behaviour. The bound magnetic polaron model is used to clarify the origin of RTFM in these films.