High-spatial resolution resistivity mapping of large-area YBCO films by a near-field millimeter-wave microscope
High-spatial resolution resistivity mapping of large-area YBCO films by a near-field millimeter-wave microscope
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利用近场毫米波显微镜对大面积 YBCO 薄膜进行高空间分辨率电阻率测绘
DOI：
10.1109/22.508246
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发表时间：
1996
影响因子：
4.3
通讯作者：
D. Davidov
中科院分区：
文献类型：
--
作者：
M. Golosovsky;A. Galkin;D. Davidov
我们展示了一种新的毫米波技术的电阻率映射的大面积导电薄膜，即近场电阻率显微镜。显微镜是基于这样的想法，即电磁波通过一个狭窄的共振狭缝传输，具有高效率。通过在非均匀导电表面上方的固定高度处扫描该狭缝并测量反射波的强度和相位，可以使用80-GHz辐射以10-100 /spl μ/m的空间分辨率确定该表面的电阻率。使用这种技术，我们映射正常状态下的电阻率为1英寸/SPL倍/1的YBCO薄膜在环境温度下。在某些薄膜中，我们发现正常状态薄层电阻的不均匀性为10%-20%。
We demonstrate a new millimeter-wave technique for the resistivity mapping of large-area conducting films, namely, a near-field resistivity microscope. The microscope is based on the idea that electromagnetic waves are transmitted through a narrow resonant slit with high efficiency. By scanning this slit at fixed height above an inhomogeneous conducting surface and measuring the intensity and phase of the reflected wave, the resistivity of this surface may be determined with a 10-100 /spl mu/m spatial resolution using 80-GHz radiation. Using this technique, we map normal-state resistivity of 1 in /spl times/1 in YBCO films at ambient temperature. In some films we find inhomogeneities of the normal-state sheet resistance of the order of 10%-20%.