Internal stress and optical properties of Nb2O5 thin films deposited by ion-beam sputtering.
Internal stress and optical properties of Nb2O5 thin films deposited by ion-beam sputtering.
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DOI：
10.1364/ao.41.002043
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发表时间：
2002-04
期刊：
影响因子：
1.9
通讯作者：
Cheng-chung Lee;C. Tien;J. Hsu
中科院分区：
文献类型：
--
作者：
Cheng-chung Lee;C. Tien;J. Hsu
研究了离子束能量对Nb 2 O 5薄膜内应力和光学性能的影响。采用离子束溅射法在未加热的玻璃基片上沉积了Nb 2 O 5薄膜。的折射率，消光系数，和表面粗糙度被发现依赖于离子束能量。利用相移干涉技术测量了薄膜中的应力。Nb_2 O_5-SiO_2多层膜的平均压应力比单层Nb_2 O_5膜的平均压应力小。
The influence on the internal stress and optical properties of Nb2O5 thin films with ion-beam energy was investigated. Nb2O5 thin films were deposited on unheated glass substrates by means of ion-beam sputtering with different ion-beam voltage, Vb. The refractive index, extinction coefficient, and surface roughness were found to depend on the ion-beam energy. The stresses in thin films were measured by the phase-shifting interferometry technique. The film stress was also found to be related to Vb, and a high compressive stress of -0.467 GPa was measured at Vb = 850 V. The Nb2O5-SiO2 multilayer coatings had smaller average compressive stress as compared with single-layer Nb2O5 film.