Interface segregating fluoralkyl-modified polymers for high-fidelity block copolymer nanoimprint lithography.
Interface segregating fluoralkyl-modified polymers for high-fidelity block copolymer nanoimprint lithography.
复制标题
用于高保真嵌段共聚物纳米压印光刻的界面隔离氟烷基改性聚合物。
DOI：
10.1021/ja1094292
复制
发表时间：
2011
影响因子：
15
通讯作者：
Brett A. Helms
中科院分区：
文献类型：
--
作者：
Vincent S. D. Voet;Teresa E. Pick;Sang;M. Moritz;Aaron T. Hammack;Jeffrey J Urban;D. Frank Ogletree;D. Olynick;Brett A. Helms
嵌段共聚物（BCP）光刻是一种功能强大的技术，以极高的密度将纳米级特征的周期性阵列写入衬底中。为了将这些功能在基板上，纳米压印提供了一个看似清晰的路径走向高通量生产：纳米压印模具是可重复使用的，促进其拓扑结构内的BCP微区的graphoepitaxial对齐，并有效地对齐相对于基板使用干涉。不幸的是，当BCP的薄膜经受热纳米压印时，在模具-聚合物界面处存在压倒性程度的粘附，这损害了整个过程。在这里，我们报告的添加剂的合成，以减轻粘附的基础上，无论是PS或PDMS与短，界面活性氟烷基链。当与PS-b-PDMS BCP共混并进行热纳米压印时，特别是观察到氟烷基改性的PS基本上降低了膜对模具的粘附力，导致几乎无缺陷的纳米压印。随后的光刻程序显示出亚10 nm BCP微域的优异的图形外延对准，这是迈向低成本、高产量纳米织物的关键一步。
Block copolymer (BCP) lithography is a powerful technique to write periodic arrays of nanoscale features into substrates at exceptionally high densities. In order to place these features at will on substrates, nanoimprint offers a deceptively clear path toward high throughput production: nanoimprint molds are reusable, promote graphoepitaxial alignment of BCP microdomains within their topography, and are efficiently aligned with respect to the substrate using interferometry. Unfortunately, when thin films of BCPs are subjected to thermal nanoimprint, there is an overwhelming degree of adhesion at the mold-polymer interface, which compromises the entire process. Here we report the synthesis of additives to mitigate adhesion based on either PS or PDMS with short, interface-active fluoroalkyl chains. When blended with PS-b-PDMS BCPs and subjected to a thermal nanoimprint, fluoroalkyl-modified PS in particular is observed to substantially reduce film adhesion to the mold, resulting in a nearly defect-free nanoimprint. Subsequent lithographic procedures revealed excellent graphoepitaxial alignment of sub-10 nm BCP microdomains, a critical step toward lower-cost, high-throughput nanofabrication.