Nanoindentation investigation of Ti/TiN multilayers films
Nanoindentation investigation of Ti/TiN multilayers films
复制标题
DOI：
10.1063/1.373450
复制
发表时间：
2000-05
影响因子：
3.2
通讯作者：
M. Daia;P. Aubert;S. Labdi;C. Sant;F. Sadi;P. Houdy;Jean-Luc Bozet
中科院分区：
文献类型：
--
作者：
M. Daia;P. Aubert;S. Labdi;C. Sant;F. Sadi;P. Houdy;Jean-Luc Bozet
研究了Ti/TiN纳米叠层薄膜的硬度。采用射频溅射法在硅基片上沉积了Ti、TiN单片膜和Ti/TiN多层膜。多层膜的周期厚度从20 nm减小到2.5 nm。掠射X射线反射仪表明，调制的Ti/TiN多层膜的组成存在的所有周期的厚度考虑。从纳米压痕测量，我们确定了多层膜的硬度和杨氏模量。硬度随着周期厚度的减小而增加，以超过周期厚度为Λ λ 5 nm的样品的混合规则值。当Λ= 2.5nm时，硬度达到最大值，比混合法则所得值高1.6倍。我们的研究结果进行比较，以前介绍的基于位错的模型由Leobenzky。
The hardness of Ti/TiN nanolaminated films is investigated in this study. Monolithic Ti and TiN films and Ti/TiN multilayers were deposited on silicon substrates by radio-frequency sputtering. The period thickness of multilayers was decreased from 20 to 2.5 nm. Grazing x-ray reflectometry showed that the modulation of composition of Ti/TiN multilayers exists for all the period thickness considered. From nanoindentation measurements, we determined the hardness and Young’s modulus of multilayers. Hardness increased with decreasing period thickness to go beyond the rule-of-mixture value for samples with period thickness of Λ⩽5 nm. The maximum hardness, 1.6 times higher than the value obtained by the rule of mixture, is obtained for Λ=2.5 nm. Our results are compared to a dislocation-based model previously introduced by Lehoczky.