Experimental Demonstration of High-Voltage 4H-SiC Bi-Directional IGBTs

Experimental Demonstration of High-Voltage 4H-SiC Bi-Directional IGBTs
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高压4H-SiC双向IGBT的实验演示

DOI:
10.1109/led.2016.2581419
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发表时间:
2016
影响因子:
4.9
通讯作者:
T. Chow
T. Chow
中科院分区:
工程技术2区
文献类型:
--
作者:
S. Chowdhury;C. Hitchcock;Z. Stum;R. Dahal;I. Bhat;T. Chow

文献摘要

被引文献

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我们首次在250 μm厚的轻掺杂独立衬底上制作了双向4 H-SiC平面栅绝缘栅双极晶体管。在Si面上,在室温下获得9.7V的正向电压降(在50 A/cm 2下),具有140 mQ ·cm 2的微分导通电阻,表明良好的电导率调制。我们还证明了通过施加背栅偏置来控制BD-IGBT的静态特性中的少数载流子注入。
We experimentally demonstrate, for the first time, bi-directional 4H-SiC planar gate, insulated gate bipolar transistors fabricated on 250-μm thick, lightly doped free-standing substrates. On Si face, forward voltage drop (at 50 A/cm2) of 9.7 V was obtained at room temperature, with a differential ON-resistance of 140 mQ · cm2, indicating good conductivity modulation. We have also demonstrated control over minority carrier injection in static characteristics of the BD-IGBTs by application of a back-gate bias.