Influence of ion energy on properties of Mg alloy thin films formed by ion beam sputter deposition
Influence of ion energy on properties of Mg alloy thin films formed by ion beam sputter deposition
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离子能量对离子束溅射沉积镁合金薄膜性能的影响
DOI：
10.1016/j.surfcoat.2005.11.088
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发表时间：
2006
影响因子：
5.4
通讯作者：
B. Rauschenbach
中科院分区：
文献类型：
--
作者：
Y. Bohne;D. Seeger;C. Blawert;W. Dietzel;S. Mändl;B. Rauschenbach
合金开发的新方法包括非晶材料和非常细晶粒的合金。由于非常高的冷却速率，薄膜沉积是获得非晶或细粒材料的一种可能途径。在本贡献中，镁合金AZ91，AM50，AE42和化学纯（cp）Mg被用作离子束溅射沉积的溅射靶。能量在800和1200 eV之间的氩离子用于溅射，而Si（100）用作衬底材料。获得了非常致密和微晶织构的膜。与铸态合金相比，这些膜表现出更高的极化电阻和扩展的钝化区域的改善的腐蚀行为。的耐腐蚀性缩放与Al含量的膜，这是低于在所使用的靶合金，最有可能引起的溅射角分布强烈依赖于特定的原子种类。
New approaches in alloy development which promise improvements include both amorphous materials and very fine-grained alloys. Due to very high cooling rates, thin film deposition is one possible route to obtain amorphous or fine-grained material. In the present contribution, the magnesium alloys AZ91, AM50, AE42 and chemically pure (cp) Mg were used as sputter targets for ion beam sputter deposition. Argon ions with an energy between 800 and 1200 eV were used for sputtering while Si(100) served as substrate material. Very dense and microcrystalline textured films were obtained. These films exhibited improved corrosion behaviour with higher polarization resistance and an extended passive region compared to the as-cast alloys. The corrosion resistance scaled with the Al content of the films, which was lower than in the used target alloys, most probably caused by a sputter angle distribution depending strongly on the specific atomic species.