Very broad vacuum arc ion and plasma sources with extended large area cathodes
Very broad vacuum arc ion and plasma sources with extended large area cathodes
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DOI：
10.1063/1.1150267
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发表时间：
2000-02
影响因子：
1.6
通讯作者：
A. Ryabchikov;I. Stepanov;S. V. Dektjarev;E. Lukonin;I. Shulepov
中科院分区：
文献类型：
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作者：
A. Ryabchikov;I. Stepanov;S. V. Dektjarev;E. Lukonin;I. Shulepov
本文介绍了两种用于产生加速离子束和等离子体流的真空电弧源。这些来源的区别是通过使用直流真空电弧放电等离子体产生的基础上，一个简单的线性或同轴等离子体枪扩展大面积（70 - 300和1500平方厘米）阴极和微粒过滤系统。直流真空电弧放电与二极管引出系统相结合，使我们能够使用直流模式的等离子体流形成和重复脉冲模式的离子束产生的单一来源。本文介绍了在大面积阴极真空弧源中重复脉冲加速离子束形成的实验和数值计算结果。
Two versions of vacuum arc sources for producing accelerated ion beams and plasma flows are described. The sources are distinguished by use of a dc vacuum arc discharge for plasma generation on the basis of a simple linear or coaxial plasma gun with extended large area (70 300 and 1500 cm2) cathodes and microparticle filtering system. The dc vacuum arc discharge combined with the diode extraction system enables us to use the single source for dc mode of plasma flow formation and repetitively pulsed mode of ion beam generation. Experimental and numerical results are presented on the repetitively pulsed accelerated ion beam formation in the vacuum arc sources with large area cathodes.