High-accuracy EUV reflectometer
High-accuracy EUV reflectometer
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DOI：
10.1117/12.712853
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发表时间：
2007-03
期刊：
影响因子：
--
通讯作者：
U. Hinze;M. Fokoua;B. Chichkov
中科院分区：
文献类型：
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作者：
U. Hinze;M. Fokoua;B. Chichkov
EUV光学器件的开发人员和用户需要精确的工具来表征其产品。通常需要0.1%或更好的测量精度来检测和研究缓慢作用的老化效应或有机污染物的降解。为了实现0.1%的测量精度，需要EUV源，其提供优异的长期稳定性，即功率稳定性、空间稳定性和光谱稳定性。当然，它应该没有碎片。特别适合于该任务的EUV源是先进的基于电子的EUV管。该EUV光源在13.5 nm处提供高达300 μW的输出。反射仪受益于该工具出色的长期稳定性。我们设计和建立不同的反射计使用EUV管的EUV光学，如碎片样品，过滤器，多层反射镜，掠入射光学，收集器和掩模的精确表征。从掠入射到近垂直入射的反射率测量以及透射率研究的精度可低至0.1%。反射计由计算机控制，可在线改变和扫描所有重要参数。样品反射计的概念进行了讨论和结果。这些器械可从Laser Zentrum汉诺威e.V.购买。
Developers and users of EUV-optics need precise tools for the characterization of their products. Often a measurement accuracy of 0.1% or better is desired to detect and study slow-acting aging effect or degradation by organic contaminants. To achieve a measurement accuracy of 0.1% an EUV-source is required which provides an excellent long-time stability, namely power stability, spatial stability and spectral stability. Naturally, it should be free of debris. An EUV-source particularly suitable for this task is an advanced electron-based EUV-tube. This EUV source provides an output of up to 300 μW at 13.5 nm. Reflectometers benefit from the excellent long-time stability of this tool. We design and set up different reflectometers using EUV-tubes for the precise characterisation of EUV-optics, such as debris samples, filters, multilayer mirrors, grazing incidence optics, collectors and masks. Reflectivity measurements from grazing incidence to near normal incidence as well as transmission studies were realised at a precision of down to 0.1%. The reflectometers are computer-controlled and allow varying and scanning all important parameters online. The concepts of a sample reflectometer is discussed and results are presented. The devices can be purchased from the Laser Zentrum Hannover e.V.